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HS Code |
822319 |
| Chemical Name | 1-Diazo-2-Naphthol-4-Sulphonic Acid |
| Molecular Formula | C10H7N2O4S |
| Molecular Weight | 253.24 g/mol |
| Appearance | Yellow to orange powder |
| Melting Point | Decomposes |
| Solubility In Water | Soluble |
| Cas Number | 6359-98-4 |
| Storage Conditions | Store in a cool, dry place; keep away from light |
| Pubchem Cid | 11653747 |
| Uses | Photoresist materials, dyes and pigments intermediate |
| Stability | Sensitive to light and heat |
| Hazard Classification | May be harmful if inhaled or ingested |
As an accredited 1-Diazo-2-Naphthol-4-Sulphonic Acid factory, we enforce strict quality protocols—every batch undergoes rigorous testing to ensure consistent efficacy and safety standards.
| Packing | The packaging contains 500g of 1-Diazo-2-Naphthol-4-Sulphonic Acid, sealed in a labeled amber glass bottle with hazard symbols. |
| Container Loading (20′ FCL) | **1-Diazo-2-Naphthol-4-Sulphonic Acid:** Packed securely in 20′ FCL, moisture-proof bags/drums, ensuring safe bulk transit, suitable for industrial applications. |
| Shipping | **Shipping Description for 1-Diazo-2-Naphthol-4-Sulphonic Acid:** Ship in tightly sealed containers, protected from light and moisture. Store and transport at ambient temperature unless otherwise specified. Label clearly as a potentially hazardous chemical; handle with care to avoid spills. Follow all applicable regulations regarding the shipping of chemicals, including appropriate documentation and hazard labeling. |
| Storage | **1-Diazo-2-Naphthol-4-Sulphonic Acid** should be stored in a cool, dry, well-ventilated area, away from heat sources, direct sunlight, and incompatible substances such as strong oxidizers. Keep the container tightly closed and properly labeled. Protect from moisture and physical damage. Use explosion-proof equipment and avoid contact with ignition sources, as diazo compounds can be sensitive to impact and decomposition. |
| Shelf Life | 1-Diazo-2-Naphthol-4-Sulphonic Acid typically has a shelf life of 12-24 months when stored in a cool, dry place. |
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Purity 98%: 1-Diazo-2-Naphthol-4-Sulphonic Acid with 98% purity is used in the preparation of photoresist formulations for PCB manufacturing, where high purity ensures optimal photolithographic sensitivity and resolution. Molecular weight 307.27 g/mol: 1-Diazo-2-Naphthol-4-Sulphonic Acid of molecular weight 307.27 g/mol is used in light-sensitive coatings for offset printing, where consistent molecular weight guarantees reproducible coating thickness and image quality. Melting point 220°C: 1-Diazo-2-Naphthol-4-Sulphonic Acid with a melting point of 220°C is applied in heat-resistant pigment systems, where high thermal stability prevents decomposition during processing. Particle size <10 microns: 1-Diazo-2-Naphthol-4-Sulphonic Acid with particle size below 10 microns is used in high-precision photoresist films for semiconductor fabrication, where fine particle size enables uniform layer distribution and sharp pattern definition. Aqueous stability at pH 7: 1-Diazo-2-Naphthol-4-Sulphonic Acid exhibiting aqueous stability at pH 7 is formulated in water-based emulsions for screen printing, where stability ensures long shelf-life and reliable printing performance. Sulfonation degree 1.0: 1-Diazo-2-Naphthol-4-Sulphonic Acid with sulfonation degree of 1.0 is used in dye intermediate synthesis, where defined sulfonation provides predictable dye shade and solubility profiles. Light absorption λmax 345 nm: 1-Diazo-2-Naphthol-4-Sulphonic Acid with maximum light absorption at 345 nm is employed in UV-sensitive coatings, where precise absorption enhances photoreactivity and pattern transfer fidelity. Viscosity 30 mPa·s (in standard solvent): 1-Diazo-2-Naphthol-4-Sulphonic Acid with viscosity of 30 mPa·s in standard solvent is utilized in liquid photopolymer compositions, where controlled viscosity ensures smooth coating and defect-free films. |
Competitive 1-Diazo-2-Naphthol-4-Sulphonic Acid prices that fit your budget—flexible terms and customized quotes for every order.
For samples, pricing, or more information, please contact us at +8615371019725 or mail to sales7@bouling-chem.com.
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Email: sales7@bouling-chem.com
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Every batch of 1-Diazo-2-Naphthol-4-Sulphonic Acid that leaves our plant reflects decades spent refining the process, listening closely to how innovators, print makers, and industrial chemists actually use this vital compound. In an industry crowded by intermediaries and second-hand product peddlers, we prefer to cut to the chase: this diazotized sulfonated naphthol remains a building block for modern photoactive applications, but not all products out there match the reliability or performance needed in high-precision settings. Stepping through the reasons can help you see where genuine manufacturing experience makes a difference.
Every month, our production team pulls raw 2-naphthol from partner aromatic chemical units—these relationships stretch back over a decade. Clean base input ensures the diazotization proceeds smoothly, resulting in a crisp, vivid yellow powder, with batch records tracing each drum to the source. We've watched too many users struggle because resellers source from inconsistent supply chains; purity floats, yield drops, or contamination creeps in, throwing off coating properties in photoresist formulation. By investing in closed-system sulfonation and triggered nitrogen feed controls, our process keeps Nitroso and Sulphonic group concentrations tightly locked, batch after batch.
We produce 1-Diazo-2-Naphthol-4-Sulphonic Acid in a standardized model—typified by an assay above 98%, moisture content below 1.5%, and free sulphuric acid content consistently below 0.5%. Particle size hovers between 40 and 120 mesh, suitable for direct dissolution or blending in solvent-based photosensitive mixtures. After years of customer feedback, we know this matters where cycle times on blending lines or filter blockages cost real money. Our production flow avoids micronization steps that can degrade the diazo group, so the compound always arrives with robust photoreactivity. Lab techs in our QC unit run fresh HPLC and UV-VIS scans on every lot, confirming the absorption peak—there’s no relying on aging, possibly decomposed material that makes its way onto the market through warehousing delays or improper handling.
For photoresist developers, screen printers, and specialty ink houses, this compound isn't just a chemical—it's the very trigger for image formation and pattern transfer. On the production floor, we’ve watched operators depend on the sharp exposure contrast that comes only when the diazo group holds its own against ambient humidity, airborne amines, or inconsistent drying. Our acid sits at a pH that balances photosensitivity with aqueous stability; this detail saves printmakers hours otherwise lost to trial-and-error dilution or recalibrating exposure intervals. In resins, this acid forms the core light-reactive matrix. Anyone hand-mixing batches can spot a poorly synthesized version: cloudy dissolution, residual grit, ghosting after washout, or stubborn residues during development. Our powder disperses fast and clean in both water and DMF, opening the possibility for rapid-scale formulations without nucleation issues or slow-release problems.
People new to diazo chemistry sometimes lump all diazo-naphthol sulphonics together, but slight modifications on the naphthol ring—say a shift to the 5-sulphonic or switching to the 4, 6 isomer—change both reactivity and solubility profiles. We focus on the 1-diazo-2-naphthol-4-sulphonic acid variant because its light absorption curve best matches the UV wavelengths favored by modern exposure units. Those using 3-sulphonic or 5-sulphonic analogs often run into problems with color instability or need for higher dosages in their formulations to reach the same photosolubility, tipping up costs and introducing more waste. As a direct producer, we’ve trialed nearly a dozen substitution patterns in-house, and after 25 years, we’ve stuck with the 4-sulphonic arrangement. This model maintains high shelf life, wetting properties, and reliable image transfer without cyan build-up or yellow shift that throws color balances in sensitive litho or gravure printing.
Handling diazo compounds always brings headaches for those unaccustomed to their sensitivities—small process hiccups spell much bigger trouble after mixing or storage. Our factory layout gives space to dedicated storage vaults with controlled humidity, plus triple-sealed packaging at dispatch. This isn’t a luxury: users down the line see a dramatic difference in batch-to-batch solubility, purity on spec, and the absence of isomeric contaminants. Some products passed through too many hands arrive oxidized, releasing the telltale whiff of decomposition—think of the musty odor like an old book or spoiled film. We run a direct chain of custody from mixer to dock; nothing sits long or travels loosely.
We don't rely on academic theory. Every improvement stems from hands-on interaction with photoresist makers, silk-screen managers, R&D chemists in the field, all wrangling with the quirks of this molecule in the real world. A few years ago, one of our print partners noticed faint edge rash after exposure. Together we ran through the process, eventually singling out a minor trace of iron, carried over from an old chiller coil. We swapped parts, tweaked a cleaning protocol, and the problem disappeared. That sort of troubleshooting runs throughout a chemical manufacturer’s daily rhythm—it grounds every technical answer in firsthand testing, not just what a data sheet suggests.
The regulatory landscape around azo and sulphonated naphthol derivatives keeps changing. European and North American authorities keep a close eye on purity, by-product elimination, and controlled nitrogen content. To support compliance, our reactors include staged temperature monitoring and vent scrubbers, which trap any stray nitrogen oxides before venting. Purity checks trace all potential contaminants, as well as unwanted by-products, down to parts-per-million. Material Safety Data Sheets reflect current thresholds and our batch records support straightforward auditing. We also rework waste streams from neutralization so spent acids serve as fertilizer base, closing the loop for sustainability. For end users, this means fewer headaches at customs or during eco-labeling reviews.
Technical sales pitches only carry so far. We supply customers who run high-speed offset printing lines two shifts a day and artists who prep limited-run screens for couture textiles. It's their day-to-day that beats any marketing bullet-point. Once, a loyal user flagged some unexpected lumping—mid-summer, their warehouse temperature soared above 40°C. After digging in, we adjusted our moisture testing and doubled silica gel packs in shipments during hotter months. The change traveled upstream: all drying cycles now run a bit longer, and we monitor air inlet conditions more tightly as seasons shift. Patching small pain points from the user's end of the pipeline keeps quality steady.
A photoresist developer measuring down to the last micron can't afford standing puddles, crystalline residue, or inconsistent photo-speed. The best naphthol-sulphonic acid matches precise sensitivity, holds its shelf life for months, and dissolves out without fouling expensive exposure or development machinery. Our staff test finished lots under real UV lamps—anything with off-hue, clumping, or shade drift never makes it to dispatch. The same logic applies to those crafting technical coatings, architectural blueprints, or precision printed circuit boards. Minor impurities in the source chemical multiply headaches at every step. By homing in on the critical few specifications that matter to end use—not perfunctory check-box specs—we make sure those costly headaches never enter the process.
Plenty of new users land on generic supplies, either through online catalogues or warehouse brokers. Usually, these come with impressive labels and long lists of nominal characteristics. More often than not, experienced users notice subtle but expensive shortcomings: blending difficulties, reduced shelf life, or small deviations in critical light absorption spectrum. Our model draws on backtracking production from the aromatic base, so every kilo carries a full dossier of handling, testing, and composition information. With resellers, once something goes wrong—be it product recall, contamination scare, or end-use failure—tracing the cause becomes almost impossible. A direct relationship with a primary manufacturer like us closes that risk. We take responsibility for every stage, from base chemical generation, through sulphonation and diazotization, purification, blending, packing, and real-world testing before shipment. That’s balance sheet savings and risk reduction, far beyond what a speculative third party can offer.
As a direct manufacturer with long partnerships across diverse uses, we make sure the technical answers count. If a film developer phones in about unexpected burnout, or a plant engineer flags an IR spectral shift, our bench chemists work alongside them to diagnose and fix the problem. This complements written documentation and reduces trial-and-error wasted effort at the customer’s end. No one appreciates spending time recalibrating tanks or babysitting finicky blends; issues fixed at the root, right at the chemical source, mean less downtime and better end results.
Some manufacturers seek a quick win by tweaking process temperatures, skipping secondary filtrations, or diluting to stretch the output. Any shortcuts we’ve measured firsthand cause more equipment scaling, more incomplete development, and more failed prints. Our philosophy rewards sticking to the best process, streamlining only where gains support both safety and final product usability. That means consistently high photoresponse, majority single isomer content, and color stability throughout the shelf life—no need for careful dance steps during downstream mixing or exposure.
Digital advances keep shifting traditional print and resist chemistry, but new niche processes—high-resolution textile printing, microelectronics patterning, and screen development for advanced manufacturing—still demand perfect diazo-naphthol acid. What’s changing? Lower-tolerance equipment accepts only well-characterized material; sloppy supply chains can't keep up. Environmental mandates get stricter, placing a premium on source transparency and reduced emission footprints. From the manufacturer’s perch, this calls for constant reinvestment in process efficiency, cleaner chemistries, and more detailed reporting. Our technical teams dig into long-term stability studies, fast-dissolution prototypes for accelerated production lines, and zero-waste batch documentation for regulatory sign-off. By keeping a pulse on the evolution of end user requirements, we mold every process tweak to serve real-world needs.
It’s easy for a chemical to feel like a commodity. Experience on the production floor tells a different story. With 1-Diazo-2-Naphthol-4-Sulphonic Acid, every decision—every control setting, every lab check, every customer conversation—shapes both reliability and progress downstream. What looks like just a yellow powder forms the backbone of image transfer, micro-patterning, and creative output for thousands across the globe. As direct producers, we value long-term relationships—not transactional sales—built on trust, transparency, and uncompromising technical support. This approach has earned us return users who stake their own reputations on what we deliver. Standing directly behind our manufacturing process, we help drive both innovation and dependable results where precision and reliability can’t be compromised.